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3 edition of X-ray, extreme and far ultraviolet optical thin films for space applications found in the catalog.

X-ray, extreme and far ultraviolet optical thin films for space applications

X-ray, extreme and far ultraviolet optical thin films for space applications

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Published by University of Alabama in Huntsville, Physics Dept., National Aeronautics and Space Administration, National Technical Information Service, distributor in Huntsville, AL, [Washington, DC, Springfield, Va .
Written in English

    Subjects:
  • Thin films -- Optical properties.

  • Edition Notes

    StatementMuamer Zukic, Douglas G. Torr and Jongmin Kim.
    SeriesNASA contractor report -- NASA CR-194635.
    ContributionsTorr, Douglas., Jongmin Kim., United States. National Aeronautics and Space Administration.
    The Physical Object
    FormatMicroform
    Pagination1 v.
    ID Numbers
    Open LibraryOL15387988M

    Advances in Optical Thin Films VI Monday - Thursday 14 - 17 May Conference Sessions At A Glance. High reflectance broadband thin films used in x-ray telescopes Paper Time: PM - PM Enhanced far-UV reflectance of Al mirrors protected with hot-deposited MgF 2 Paper Time: PM - PM. Optical properties works Search for books with subject N. K. Sahoo Not In Library. Read. Not In Library. Read. Borrow. X-ray, extreme and far ultraviolet optical thin films for space applic Muamer Zukic , Materials, Solids, Polymers, Nonlinear optics, Thin films, Optoelectronic devices, Photonics, Nanostructured.

    The most commonly used instrument for the measurement of the optical performance of thin-film coatings is a spectrometer. Using a StellarNet fiber optic spectrometer coupled to a reflectance probe and fiber optic light source, it is possible to measure film thickness by detecting the sinusoidal fringe pattern from the samples specular reflectance. Feature open The History of the X-ray Laser. Jeff Hecht. The long and curious history of the X-ray laser began in an effort to expand the frontier of knowledge and culminated in one of the wildest schemes ever pursued by the United States government—the “Star Wars” missile defense initiative in the s.

    Ultraviolet (UV) is electromagnetic radiation with wavelength from 10 nm (with a corresponding frequency of approximately 30 PHz) to nm ( THz), shorter than that of visible light but longer than radiation is present in sunlight, and constitutes about 10% of the total electromagnetic radiation output from the is also produced by electric arcs and .   Multilayer thin-film filters from different materi al pairs with spectral windows within the wavelength range 7n Optical characteristics of samples in the extreme ultraviolet, visible, and IR spectrum ranges were studied. Ultrathin freestanding Zr/Si large-aperture filters with transparencies up to 76% at 7n = 13 nm were manufactured for Cited by: 6.


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X-ray, extreme and far ultraviolet optical thin films for space applications Download PDF EPUB FB2

X ray, extreme and far ultraviolet optical thin films for space applications Article (PDF Available) February with 41 Reads How we measure 'reads'. Get this from a library. X-ray, extreme and far ultraviolet optical thin films for space applications.

[Muamer Zukic; Douglas Torr; Jongmin Kim.; United States. National Aeronautics and Space Administration.]. Ic//o 4/1 X-ray, extreme and far ultraviolet optical thin films for space applications (NASA-CR) X RAY, EXTREME AND FAR ULTRAVIOLET OPTICAL THIN FILMS FOR SPACE APPLICATIONS (Alabama Univ.

Buy X-Ray and Extreme Ultraviolet Optics: JulySan Diego, California (Proceedings of Spie--The International Society for Optical Engineering, V.

) on FREE SHIPPING on qualified orders. X-Rays and Extreme Ultraviolet Radiation: Principles and Applications Currently unavailable. This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip Cited by: X-Ray and Extreme Ultraviolet Optics Richard B.

Hoover Arthur B. Walker, Jr. Chairsi'Editors July San Diego, California Sponsored and Published by SPIE—The International Society for Optical Engineering P Volume SPIE (The Society of Photo-Optical Instrumentation Engineers) is a nonprofit society dedicated to the.

In recent years interest in developing optical reflective coatings with high efficiency for the so-called far ultraviolet (FUV) down to 50 nm has grown considerably in optical thin film community.

Many important spectral lines locate in this special spectral region, and are of great interest to some applications, such as astrophysics, solar Cited by: 1. This thesis addresses research works on the development and metrology of multilayer thin-film coatings designed for Extreme Ultraviolet (EUV) and soft X-ray spectral regions.

While the development part is limited to reflective multilayers at 6.x nm wavelength, significant part of the thesis is devoted to the metrology of multilayers (MLs) in broader spectral : Mewael Giday Sertsu, Larissa Juschkin, Piergiorgio Nicolosi.

The Advanced X-ray Astrophysics Facility (AXAF) is the x-ray component of NASA's Great Observatories. To be launched in lateAXAF will provide unprecedented capabilities for high-resolution imaging, spectrometric imaging, and high-resolution dispersive spectroscopy, over the x-ray band from about keV to 10 keV.

WithAuthor: M. Weisskopf, S. O'Dell, R. Elsner. Development of the extreme ultraviolet and soft x-ray spectral regions is presently in a period of rapid growth and interchange among science and technology. Figure shows that portion of the electromagnetic spectrum extending from the in-frared to the x-ray region, with wavelengths across the top and photon energies along the bottom.

We report on the first high resolution images of the sun in the soft x-ray/extreme ultraviolet (XUV) regime obtained with normal incidence multilayer optics. The images were obtained during a sounding rocket flight on Octo from White Sands Missile Range, New by: Fresnel Zone Plate for Optical Image Formation Using Extreme Ultraviolet and Soft X Radiation ALBERT V.

BAEZ Smithsonian Astrophysical Observatory, Cambridge, Massachusetts (Received Ap ) A new type of Fresnel zone plate has been constructed which can focus ultraviolet radiation of any wavelength down to the soft x-ray region.

Microscopy with extreme ultraviolet (EUV) light can provide many advantages over optical, hard x-ray or electron-based techniques. However, traditional EUV sources and optics have large disadvantages of scale and cost. Here, we demonstrate the use of a laboratory-scale, coherent EUV source to image biological samples—mouse hippocampal neurons—providing.

X-ray Optics and X-ray Microanalysis covers the proceedings of the Symposium on X-ray Optics and X-ray Microanalysis, held at Stanford University on AugustThe book focuses on X-ray microscopy, microradiography, radiation and irradiation, and X-ray microanalysis. Coatings for biological and medical applications; Coatings for astronomy, space, and gravitational wave detection; Coatings for aerospace and defense applications; Coatings for short wavelengths: ultraviolet (UV), extreme ultraviolet (EUV or XUV), and X-ray; Coatings for visible wavelengths; Coatings for near and far IR spectral regions.

Free 2-day shipping. Buy X-Rays and Extreme Ultraviolet Radiation: Principles and Applications at The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources.

Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy.

The author begins by presenting the relevant basic principles such as radiation 4/5(1). Keywords: far ultraviolet, multilayer, thin film, polarizer, induced transmission and absorption 1. INTRODUCTION Analyzing the polarization of radiation in the far ultraviolet(FUV: nm) spectral region has been of interest since the fast report by Cole and Oppenheimer 1.

Many basic experiments in atomic and molecular physics require File Size: KB. Materion’s expertise in designing and manufacturing precision thin film coatings and optical filters for use in space, science and astronomy applications enables us to understand the needs of our customers and provide specialized material solutions to meet these requirements.

Examples of our expertise include. Abstract: The extreme ultraviolet (EUV) reflectance of amorphous tetrahedrally coordinated carbon films (ta-C) prepared by filtered cathodic vacuum arc was measured in the nm range at near normal incidence. The measured reflectance of films grown with average ion energies in the ~eV range was significantly larger than the reflectance of a C film .Perhaps you have a polycrystalline film with many orientations.

Perhaps the detector is big enough to sample a large part of the circles. You can check what materials are matched by the peaks you have. Keep in mind that some peaks could be missing.

2a) X-ray intensity. 2b) Amplitude does matter for some applications.Self-consistent optical constants of SiO2 and Ta2O5 films have been obtained for their relevance in optical coatings from the near ultraviolet to the near infrared spectral ranges, where they are transparent and have a high refractive index contrast.

Particular attention has been paid to wavelengths close to and shorter than each material cutoff. The far and the extreme ultraviolet Cited by: